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Free eBook Osa Proceedings on Extreme Ultraviolet Lithography: Proceedings of the Tropical Meeting, September 19-21, 1994 Monterey, California download

by Optical Society of America,Frits Zernike,David T. Attwood

Free eBook Osa Proceedings on Extreme Ultraviolet Lithography: Proceedings of the Tropical Meeting, September 19-21, 1994 Monterey, California download ISBN: 1557523630
Author: Optical Society of America,Frits Zernike,David T. Attwood
Publisher: Optical Society of Amer (March 1, 1995)
Language: English
Pages: 283
Category: Math Science
Subcategory: Physics
Size MP3: 1243 mb
Size FLAC: 1228 mb
Rating: 4.1
Format: mobi docx lrf txt


in Optics for Physics.

ISBN-13: 978-1557523631. in Optics for Physics. in Engineering (Books).

Start by marking Osa Proceedings on Extreme Ultraviolet Lithography .

Start by marking Osa Proceedings on Extreme Ultraviolet Lithography: Proceedings of the Topical Meeting, September 19-21, 1994, Monterey, California as Want to Read: Want to Read savin. ant to Read. Published March 28th 1995 by American Society of Civil Engineers (first published March 1995). Osa Proceedings on Extreme Ultraviolet Lithography: Proceedings of the Tropical Meeting, September 19-21, 1994 Monterey, California. 1557523630 (ISBN13: 9781557523631).

oceedings{Zernike1995OSAPO, title {OSA proceedings on extreme ultraviolet lithography}, author {Frits Zernike and David T. Attwood and Osa Topical Meeting}, year {1995} }. Frits Zernike, David T. Attwood, Osa Topical Meeting.

Extreme ultraviolet lithography is currently the leading candidate for next generation lithography. This technology requires near quarter-wave stacks Mo/Si multilayers deposited on the optical surfaces to reflect light in the 13-nm wavelength region at normal incidence.

Extreme UltraViolet Lithography(EUVL) has been regarded as a promising lithographic technology following ArF .

Extreme UltraViolet Lithography(EUVL) has been regarded as a promising lithographic technology following ArF immersion lithography for the 32 nm hp node and beyond and the EUV optical exposure system consisting of a illumination system and a projection system is a key part in the EUVL. This paper introduces several kinds of EUVL tools at home and abroad and gives their optical specifications.

Optical Society of America (corporate author) Frits Zernike (Ed.  . Availability as of the date/time indicated. Availability is subject to change. data. new books · special offers · used books.

Frits Zernike, Frits Zernike, Optical Society of America, David T. Attwood: Osa Proceedings on Extreme . 1994, ISBN: 1557523630. Attwood: Osa Proceedings on Extreme Ultraviolet Lithography: Proceedings of the Tropical Meeting, September 19-21, 1994 Monterey, California: 023 - hardcover.

SPIE Technical Paper Proceedings (see Proceedings of SPIE) . At least 25 original technical books per year via SPIE Press. SPIE Press, the only independent, not-for-profit book publisher specializing in optics and photonics technologies, produces print monographs, handbooks, tutorial texts, and field guides, as well as electronic books and apps for mobile devices. Its origins date back to 1989 with the publication of The New Physical Optics Notebook.

by Optical Society of America.

Zernike and D. T. Attwood, Ed. OSA Proceedings on Extreme Ultraviolet Lithography: Proceedings of the Topical Meeting, OSA Proceedings, Vol. 23, Washington, . Optical Society of America, 1995. D. Attwood and J. Bokor, Ed. Short Wavelength Coherent Radiation: Generation and Applications, American Institute of Physics Conference Proceedings; Optical Science and Engineering Series (No. 7), New York, NY: AIP Press, 1986. Attwood and B. L. Henke, Ed. Low Energy X-ray Diagnostics, American Institute of Physics Conference Proceedings, New York, NY: AIP Press, 1981.